ElectroHolography Laboratory

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=====Heidelberg Debug AZ3330 Oct-28-2015=====
Taylor has been having major issues with the Heidelberg and has been unable to get any waveguides written. He is one of his attempts in AZ3330:

{{::failed_waveguide_az3330.jpg?800|}}  {{::failed_waveguide_az3330_2.jpg?800|}}

Notice the parts where the film is lifted up from the surface revealing that the resist is not developed down to the substrate.

The following is an attempt of Scott in S1805:

{{::5-2umgratingheidelbergattempt.jpg?800|}}

Here the underlying Chrome was blasted off.

Fearing recipe errors I re-calibrated the recipe. It is now as follows:

<code>
======================
Az3330 SG (10/28/2015)
======================

Substrate: LiNbO3
Adhesion Promotor: HDMS (3 drops 3000 rpm 1 min)
Resist: AZ 3330 (30 drops 3000 rpm 1 min)
Soft Bake: (80°C 15 min in Oven)

WM I (4mm):
Filter: ON
Energy: 10 mW 75%
Defoc (optical): 0
Defoc (pneumatic): 10

Develop: (300 MIF 1 min)
</code>

I got the following results. The images are centered on the 10 mW 75% test. The small circle  attached to the comb in the second photo is one micron proving the recipe is working fine.

{{::az3330_10mw_75percent_results.jpg?800|}}  {{::az3330_10mw_75percent_results_closeup.jpg?800|}}

Here was the device made. The area is visually clear and under the microscope it is good too. More development or less temperature bake could help. but this is just to get us going again.

{{::10mw_75percent_waveguides.jpg?800|}}

The 10mW_80percent failed so I drove the power to 100% here are the results. First PR then Al:

{{::resist_10mw_100_1.jpg?800|}}{{::resist_10mw_100_2.jpg?800|}}

{{::al_10mw_100_1.jpg?800|}}{{::al_10mw_100_2.jpg?800|}}

ElectroHolography Laboratory

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