ElectroHolography Laboratory

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====E10====

==Past:==
X-cut. NOT PROTON EXCHANGED. 

Written with new EO device without a resistor bridge. 3mm wide at spot 30. Only lifted off in center.

Cleaned completely. 


====RB E10====
===Current:===
Two samples exist with this number one is a Resistor Bridge EO with 200nm of Chrome.

It looks like the following:\\
{{:samples:e:e10_t1.jpg?400|E10_T1}}\\
{{:samples:e:e10_t2.jpg?400|E10_T2}}\\
{{:samples:e:e10_t3.jpg?400|E10_T3}}\\

==Layout==

%%6■____■7%%\\
5■¯¯¯¯■8

%%4■____■9%%\\
3■¯¯¯¯■10

%%2■____■11%%\\
1■¯¯¯¯■12

==RB EO Resistance==
1-2: 6.3kΩ\\
5-6: 300kΩ\\
7-8: 740kΩ\\
11-12: 1.5kΩ\\


==Current==
The old resistive strips were removed and 50nm of NiCr were put in their place. A 45 min anneal was done at 350°C. As can bee seen pads 1-2 and 3-4 did not connect with the resistive strip.

It now looks like the following:\\
{{:samples:e:e10b_t1.jpg?400|E10b_T1}} \\
{{:samples:e:e10b_t2.jpg?400|E10b_T2}} \\
{{:samples:e:e10b_t3.jpg?400|E10b_T3}} \\

==Layout==

%%1■____■7%%\\
2■¯¯¯¯■8

%%3■____■9%%\\
4■¯¯¯¯■10

%%5■____■11%%\\
6■¯¯¯¯■12

==RB Resistance==
11-12: 441kΩ\\

==Future:==

ElectroHolography Laboratory

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