=====8/25/2016 Simplified PhotoLithography Tests=====
I have removed all optics except one mirror, one lens, and the interference platform. The platform can now rotate although rotation still remains unmeasured. 

==Sample S1==
2.5 min exposure, Perfect split rotation

The new setup is giving grating lines but on a order of magnitude 100x the one we want. Images were taken at 5x magnification. 

{{::s1_more_grating_lines.jpg |s1_more_grating_lines.jpg}}
{{::s1_grating_lines.jpg |s1_grating_lines.jpg}}
{{::s1_grating_lines_closer.jpg |s1_grating_lines_closer.jpg}}
{{::s1_edge_effects.jpg |s1_edge_effects.jpg}}
{{::s1_dirt.debree.damage_to_lens_effects.jpg |s1_dirt.debree.damage_to_lens_effects.jpg }}
{{::s1_area_blocked_by_mirror.jpg |s1_area_blocked_by_mirror.jpg}}

==Sample S2==
4 min exposure, Perfect split rotation.

The lines appear to be part of a large set of concentric circles. 40-25um between with a center near where the optical axis would hit the interference apparatus.

{{::s2_4min_exposure_grating_lines_near_horizonatal.jpg |s2_4min_exposure_grating_lines_near_horizonatal}}
{{::s2_4min_exposure_grating_lines.jpg |s2_4min_exposure_grating_lines}}
{{::s2_4min_exposure_grating_lines_opposite_direction.jpg |s2_4min_exposure_grating_lines_opposite_direction}}