=====Silicon Nitride Deposition=====

===Instructions on Operation:===

  - First thing is to turn the temperature up to 255C
  - Hit the pump button on the west wall
  - Vent the chamber
  - Place spacers around the chamber
  - Vacuum the chamber down to at least below 100 mTorr; usually down to 50
  - Turn on the gas in the back. Silane is turned on by tapping the big button at the bottom of the screen. There is no password; just hit enter. The gray bar at the top of the screen should turn green. The ammonia is turned on by turning the big red button to the right and turning on the power.
  - Go back to the machine. At about 240C, turn on the gases
  - Set the gas pressure to 1
  - After the temperature and pressure stabilizes, turn on the power.
  - run the seasoning run for 10 min.
  - Turn off the power, gases, and pressure
  - Turn off the vacuum, vent, re-vacuum, re-vent
  - Place the wafer, vacuum
  - Run in the same way for about 6 min
  - Once done, take out wafer, clean machine, vacuum down, turn off gases and pump power.

Things to remember:
  * Reflected power shouldn't be above 5
  * The light above the temp. control should be flashing; this indicates that the coolant is working
  * The plasma in the PECVD1 should be lavender
  * Clean the machine with IPA and the hand vacuum


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===Recipes===
about 7 min is about 100 nm.