===Polishing===
      -Cover top (transducer/waveguide side) of sample with AZ 3330 or other colored photoresist.
              -Do not spin on resist, but try to keep a smooth layer across the sample
      -Let dry overnight, or bake in a dish in the clean oven until hard (roughly 20 min at 80 C)
      -Using alignment chuck, clamp into polisher holder
      -Find the height from the sample with the dials on the polisher
      -Set polisher to several microns below edge (depending on available space between edge and bonding pads)
              -This distance is variable, since it requires that the sample edge be entirely ground off to a square
              -It is also important to have the polisher move such that the last piece of the sample hit is the edge of interest
      -Run the polisher until the sample is no longer in contact with the chuck
      -Change to a finer chuck
      -Set polisher to 1 micron deeper
      -Polish until no longer in contact
      -Repeat steps 7-9 until finished with finest  grit 
      -Clean off resist using an acetone spray and IPA rinse