====E21====

==Past:==

X-cut. Resistor Bridge with 50nm of Nickel.

The Device looks like the following:\\
^  Before Bake  ^  After Bake @ 375°C for 30 min  ^
|  {{:samples:e:e21_t1.jpg?400|E21_T1}}  |  {{:samples:e:e21_t1_ab.jpg?400|E21_T1_Ab}}  |
|  {{:samples:e:e21_t2.jpg?400|E21_T2}}  |  {{:samples:e:e21_t2_ab.jpg?400|E21_T2_AB}}  |
|  {{:samples:e:e21_t3.jpg?400|E21_T3}}  |  {{:samples:e:e21_t3_ab.jpg?400|E21_T3_AB}}  |

==Layout==
^  Before Bake  ^  After Bake @ 375°C for 30 min  ^
|  %%1■____■7%%\\ 2■¯¯¯¯■8\\ %%3■____■9%%\\ 4■¯¯¯¯■10\\ %%5■____■11%%\\ 6■¯¯¯¯■12  |  %%6■____■7%%\\ 5■¯¯¯¯■8\\ %%4■____■9%%\\ 3■¯¯¯¯■10\\ %%2■____■11%%\\ 1■¯¯¯¯■12  |


==Resistance==

^  Before Bake  ^  After Bake @ 375°C for 30 min  ^
|  5-6: 296Ω |  1-2: 18kΩ  |
|    |  5-6: 268kΩ  |
|    |  7-8: 19KΩ  |
|    |  9-10: 14kΩ  |

==Current==
The old resistive strips were removed and 50nm of NiCr were put in their place. A 45 min anneal was done at 350°C.

It now looks like the following:\\
{{:samples:e:e21b_t1.jpg?400|E21b_T1}} \\
{{:samples:e:e21b_t2.jpg?400|E21b_T2}} \\
{{:samples:e:e21b_t3.jpg?400|E21b_T3}} \\

==Layout==

%%1■____■7%%\\
2■¯¯¯¯■8

%%3■____■9%%\\
4■¯¯¯¯■10

%%5■____■11%%\\
6■¯¯¯¯■12

==RB Resistance==
1-2: 760kΩ\\
3-4: 30kΩ\\
5-6: 42Ω\\
7-8: 1.2kΩ\\
11-12: 21Ω\\

It appears that on 11-12 I hit the old resistive strip and am getting a reading for 50nm of Ni. For 5-6 the old resistive strip shows signs of previous wire bounds which may be doing a similar thing.

==Future:==