==================== ==HIMT KQ (Kamran) (3/4/2016)== ==================== Substrate: Al+thick lithium niobate Adhesion Promotor: HDMS (3000 rpm 8 sec) Resist: 1:1 Dilute s1805 (3 drops 3000 rpm 46 sec+6000 for 6 sec) Soft Bake: (100°C in oven for 15min) WM I (4mm): Filter: ON Energy: 5 mW 27% Develop with new MIF300 for 35 sec Etch time varies for different Al etchant. 37 sec in Dr. Smalley's etchant.