First Photolithography Tests

the results of the first photolithography tests will be placed on this page. I will try to keep the top here up to date with news.

As for now I have seen that 5 minutes over exposes the plate. My beam is horribly non-uniform. And that I may be getting some sort of line creating interference in a few cases but not what I want.

Currently the beam is not collimated. The next test will try to use collimated light.

Sample 2

This was a five min exposure which reveiled ho non-uniform my beam is. The side nearest the mirror was way overexposed while the distance away was not even enough to show interference. Some vertical lines were discovered but they vary in almost sinc like way similar to astigmatism or a cylindrical lens. I need collimated light entering the mirror.

definate_lines definate_lines_40x distinct_lines_100x possible_region_of_success strange_dot_midway_up_from_left_corner_of_flat washed_away_edge_from_over_exposuremore_dust_marks_in_partway_developed_region color_variations_in_partway_developed_region

Sample 1

This was the first try. The lenses appears to be dirty or damaged. The exposure was too short. The exposure was a varied exposure created by moving a card slowly out of the way of the sample.

effects_caused_by_dirt longest_exposure_vs_no_exposure microscope_light_exposure_dot_mled zoomed_out_effects_caused_by_long_particles zoomed_out_effects_caused_by_dirt