Used SiO2 mask to create channels and 2.4mm non-proton exchanged region. Proton exchanged 14min, annealed 45min.
HF etch 2 minutes to remove mask.
https://www.youtube.com/watch?v=YQcsyO86YUY
https://www.youtube.com/watch?v=LfevDfhdQys
https://www.youtube.com/watch?v=ZFIPWbthADk
prepped with LOR and pmma for writing.
Sample fabricated by Jacob Kimball page updated 16 June 2015