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==HIMT KQ (Kamran) (3/4/2016)==
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Substrate: Al+thick lithium niobate
Adhesion Promotor: HDMS (3000 rpm 8 sec)
Resist: 1:1 Dilute s1805 (3 drops 3000 rpm 46 sec+6000 for 6 sec)
Soft Bake: (100°C in oven for 15min)
WM I (4mm):
Filter: ON
Energy: 5 mW 27%
Develop with new MIF300 for 35 sec

Etch time varies for different Al etchant.

37 sec in Dr. Smalley's etchant.