the results of the first photolithography tests will be placed on this page. I will try to keep the top here up to date with news.

As for now I have seen that 5 minutes over exposes the plate. My beam is horribly non-uniform. And that I may be getting some sort of line creating interference in a few cases but not what I want.

Currently the beam is not collimated. The next test will try to use collimated light.

This was a five min exposure which reveiled ho non-uniform my beam is. The side nearest the mirror was way overexposed while the distance away was not even enough to show interference. Some vertical lines were discovered but they vary in almost sinc like way similar to astigmatism or a cylindrical lens. I need collimated light entering the mirror.

This was the first try. The lenses appears to be dirty or damaged. The exposure was too short. The exposure was a varied exposure created by moving a card slowly out of the way of the sample.